Publication:

Effect of Cl in gate oxidation

Date

1997
Proceedings Paper
Simple item page Full metadata Statistics
 
dc.contributor.authorMertens, Paul
dc.contributor.authorMcGeary, M. J.
dc.contributor.authorSchaekers, Marc
dc.contributor.authorSprey, Hessel
dc.contributor.authorVermeire, Bert
dc.contributor.authorDepas, Michel
dc.contributor.authorMeuris, Marc
dc.contributor.authorHeyns, Marc
dc.contributor.imecauthorMertens, Paul
dc.contributor.imecauthorSchaekers, Marc
dc.contributor.imecauthorSprey, Hessel
dc.contributor.imecauthorMeuris, Marc
dc.contributor.imecauthorHeyns, Marc
dc.contributor.orcidimecMeuris, Marc::0000-0002-9580-6810
dc.date.accessioned2021-09-30T09:18:07Z
dc.date.available2021-09-30T09:18:07Z
dc.date.embargo9999-12-31
dc.date.issued1997
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/2020
dc.source.beginpage149
dc.source.conferenceMaterials Reliability in Microelectronics VII
dc.source.conferencedate31/03/1997
dc.source.conferencelocationSan Francisco, CA USA
dc.source.endpage160
dc.title

Effect of Cl in gate oxidation

dc.typeProceedings paper
dspace.entity.typePublication
Files

Original bundle

Name:
1994.pdf
Size:
609.31 KB
Format:
Adobe Portable Document Format
Download
Publication available in collections:
Conference contributions