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High-Q photonic crystal nanocavities on 300 mm SOI substrate fabricated by 193 nm immersion lithography

Date

2012
Proceedings Paper
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dc.contributor.authorXie, Weiqiang
dc.contributor.authorFiers, Martin
dc.contributor.authorSelvaraja, Shankar
dc.contributor.authorVan Campenhout, Joris
dc.contributor.authorAbsil, Philippe
dc.contributor.authorVan Thourhout, Dries
dc.contributor.imecauthorVan Campenhout, Joris
dc.contributor.imecauthorAbsil, Philippe
dc.contributor.imecauthorVan Thourhout, Dries
dc.contributor.orcidimecVan Campenhout, Joris::0000-0003-0778-2669
dc.contributor.orcidimecVan Thourhout, Dries::0000-0003-0111-431X
dc.date.accessioned2021-10-20T19:07:54Z
dc.date.available2021-10-20T19:07:54Z
dc.date.embargo9999-12-31
dc.date.issued2012
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/21867
dc.source.beginpage183
dc.source.conferenceProceedings of the Annual Symposium of the IEEE Photonics Society Benelux Chapter
dc.source.conferencedate29/11/2012
dc.source.conferencelocationMons Belgium
dc.source.endpage186
dc.title

High-Q photonic crystal nanocavities on 300 mm SOI substrate fabricated by 193 nm immersion lithography

dc.typeProceedings paper
dspace.entity.typePublication
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