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Differential inhibition during Cu electrodeposition on Ru: combined electrochemical and real-time TEM studies

Date

2019
Journal article
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dc.contributor.authorVereecken, Philippe
dc.contributor.authorRadisic, Alex
dc.contributor.authorRoss, Frances
dc.contributor.imecauthorVereecken, Philippe
dc.contributor.imecauthorRadisic, Alex
dc.contributor.orcidimecVereecken, Philippe::0000-0003-4115-0075
dc.date.accessioned2021-10-27T22:27:13Z
dc.date.available2021-10-27T22:27:13Z
dc.date.issued2019
dc.identifier.issn0013-4651
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/34357
dc.identifier.urlhttp://jes.ecsdl.org/content/166/1/D3129.abstract
dc.source.beginpageD3129
dc.source.endpageD3135
dc.source.issue1
dc.source.journalJournal of the Electrochemical Society
dc.source.volume166
dc.title

Differential inhibition during Cu electrodeposition on Ru: combined electrochemical and real-time TEM studies

dc.typeJournal article
dspace.entity.typePublication
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