The mask contribution as part of the intra-field on-product overlay performance

dc.contributor.author	van Haren, Richard
dc.contributor.author	Steinert, Steffen
dc.contributor.author	Mouraille, Orion
dc.contributor.author	Hermans, Jan
dc.contributor.author	van Dijk, Leon
dc.contributor.author	Beyer, Dirk
dc.contributor.imecauthor	Hermans, Jan
dc.contributor.orcidimec	Hermans, Jan::0000-0003-1249-8902
dc.date.accessioned	2022-01-27T11:11:46Z
dc.date.available	2021-11-02T16:03:35Z
dc.date.available	2022-01-27T11:10:29Z
dc.date.available	2022-01-27T11:11:46Z
dc.date.issued	2020
dc.identifier.doi	10.1117/12.2573190
dc.identifier.eisbn	978-1-5106-3844-0
dc.identifier.issn	0277-786X
dc.identifier.uri	https://imec-publications.be/handle/20.500.12860/38065
dc.publisher	SPIE-INT SOC OPTICAL ENGINEERING
dc.source.conference	Photomask Technology Conference
dc.source.conferencedate	SEP 21-25, 2020
dc.source.conferencelocation	San Jose, CA, USA
dc.source.journal	Proceedings of SPIE
dc.source.numberofpages	13
dc.source.volume	11518
dc.title	The mask contribution as part of the intra-field on-product overlay performance
dc.type	Proceedings paper
dspace.entity.type	Publication
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