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Scanning spreading resistance microscopy for the calibration of process simulators on 65nm MOS technology.
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Scanning spreading resistance microscopy for the calibration of process simulators on 65nm MOS technology.
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Date
2007
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Vemula, Sri Charan
;
Eyben, Pierre
;
De Keersgieter, An
;
Mody, Jay
;
Vandervorst, Wilfried
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1883
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Acq. date: 2025-12-12
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Metrics
Views
1883
since deposited on 2021-10-16
1
last month
Acq. date: 2025-12-12
Citations