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The application of ozone in semiconductor cleaning processes - the solubility issue

Date

2001
Journal article
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dc.contributor.authorDe Smedt, Frank
dc.contributor.authorDe Gendt, Stefan
dc.contributor.authorHeyns, Marc
dc.contributor.authorVinckier, Chris
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.imecauthorHeyns, Marc
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.date.accessioned2021-10-14T16:46:50Z
dc.date.available2021-10-14T16:46:50Z
dc.date.issued2001
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/5204
dc.source.beginpageG487
dc.source.endpageG493
dc.source.issue9
dc.source.journalJournal of the Electrochemical Society
dc.source.volume148
dc.title

The application of ozone in semiconductor cleaning processes - the solubility issue

dc.typeJournal article
dspace.entity.typePublication
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