Publication:
Optical extensions integration for a 0.314-μm² 45-nm node 6-transistor SRAM cell
Date
| dc.contributor.author | Verhaegen, Staf | |
| dc.contributor.author | Nackaerts, Axel | |
| dc.contributor.author | Wiaux, Vincent | |
| dc.contributor.author | Hendrickx, Eric | |
| dc.contributor.author | Vandenberghe, Geert | |
| dc.contributor.imecauthor | Wiaux, Vincent | |
| dc.contributor.imecauthor | Hendrickx, Eric | |
| dc.contributor.imecauthor | Vandenberghe, Geert | |
| dc.contributor.orcidimec | Wiaux, Vincent::0000-0002-8923-5708 | |
| dc.contributor.orcidimec | Hendrickx, Eric::0000-0003-2516-0417 | |
| dc.date.accessioned | 2021-10-16T06:49:28Z | |
| dc.date.available | 2021-10-16T06:49:28Z | |
| dc.date.issued | 2005 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/11507 | |
| dc.source.beginpage | 120 | |
| dc.source.conference | Design and Process Integration for Microlithography III | |
| dc.source.conferencedate | 27/02/2005 | |
| dc.source.conferencelocation | San Jose, CA USA | |
| dc.source.endpage | 130 | |
| dc.title | Optical extensions integration for a 0.314-μm² 45-nm node 6-transistor SRAM cell | |
| dc.type | Proceedings paper | |
| dspace.entity.type | Publication | |
| Files | ||
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