Publication:

2D Laser lithography on silicon subtrates via photoinduced copper-mediated radical polymerization

Date

2018
Journal article
https://doi.org/10.1039/c7cc08444g
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dc.contributor.authorLaun, Joachim
dc.contributor.authorDe Smet, Yana
dc.contributor.authorVan de Reydt, Emma
dc.contributor.authorKrivcov, Alexander
dc.contributor.authorTrouillet, Vanessa
dc.contributor.authorWelle, Alexander
dc.contributor.authorMöbius, Hildegard
dc.contributor.authorBarner-Kowollik, Christopher
dc.contributor.authorJunkers, Tanja
dc.date.accessioned2021-10-25T21:34:49Z
dc.date.available2021-10-25T21:34:49Z
dc.date.embargo9999-12-31
dc.date.issued2018
dc.identifier.doi10.1039/c7cc08444g
dc.identifier.issn1359-7345
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/31124
dc.identifier.urlhttp://pubs.rsc.org/en/Content/ArticleLanding/2018/CC/C7CC08444G#!divAbstract
dc.source.beginpage751
dc.source.endpage754
dc.source.issue7
dc.source.journalChemical Communications
dc.source.volume54
dc.title

2D Laser lithography on silicon subtrates via photoinduced copper-mediated radical polymerization

dc.typeJournal article
dspace.entity.typePublication
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