Publication:

Stripping of ion implanted photoresist by Co2 cryogenic pre-treatment followed by wet cleaning

Date

2008
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dc.contributor.authorMalhouitre, Stephane
dc.contributor.authorVos, Rita
dc.contributor.authorBanerjee, Souvik
dc.contributor.authorBearda, Twan
dc.contributor.authorMertens, Paul
dc.contributor.imecauthorVos, Rita
dc.contributor.imecauthorMertens, Paul
dc.date.accessioned2021-10-17T08:43:20Z
dc.date.available2021-10-17T08:43:20Z
dc.date.embargo9999-12-31
dc.date.issued2008
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/14104
dc.source.conference9th International Symposium on Ultra Clean Processing of Semiconductor Surfaces - UCPSS
dc.source.conferencedate22/09/2008
dc.source.conferencelocationBrugge Belgium
dc.title

Stripping of ion implanted photoresist by Co2 cryogenic pre-treatment followed by wet cleaning

dc.typeOral presentation
dspace.entity.typePublication
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