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Defects reduction and characterization of epitaxial Si:C/Si:C:P layers grown using cyclic deposition and etching technique

Date

2014
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dc.contributor.authorDhayalan, Sathish Kumar
dc.contributor.authorLoo, Roger
dc.contributor.authorRosseel, Erik
dc.contributor.authorHikavyy, Andriy
dc.contributor.authorShimura, Yosuke
dc.contributor.authorNuytten, Thomas
dc.contributor.authorDouhard, Bastien
dc.contributor.authorVandervorst, Wilfried
dc.contributor.imecauthorLoo, Roger
dc.contributor.imecauthorRosseel, Erik
dc.contributor.imecauthorHikavyy, Andriy
dc.contributor.imecauthorNuytten, Thomas
dc.contributor.imecauthorDouhard, Bastien
dc.contributor.imecauthorVandervorst, Wilfried
dc.contributor.orcidimecLoo, Roger::0000-0003-3513-6058
dc.contributor.orcidimecHikavyy, Andriy::0000-0002-8201-075X
dc.contributor.orcidimecNuytten, Thomas::0000-0002-5921-6928
dc.date.accessioned2021-10-22T01:17:03Z
dc.date.available2021-10-22T01:17:03Z
dc.date.embargo9999-12-31
dc.date.issued2014
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/23764
dc.identifier.urlhttp://www.emrs-strasbourg.com/index.php?option=com_abstract&task=view&id=276&day=2014-09-15&year=2014&Itemid=&id_season=12
dc.source.beginpageJ38
dc.source.conferenceE-MRS Fall meeting Symposium J: Alternative Semiconductor Integration in Si Microelectronics
dc.source.conferencedate15/09/2014
dc.source.conferencelocationWarsaw Poland
dc.title

Defects reduction and characterization of epitaxial Si:C/Si:C:P layers grown using cyclic deposition and etching technique

dc.typeMeeting abstract
dspace.entity.typePublication
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