Publication:

Recent advances in copper based interconnect reliability

Date

2010
Meeting abstract
Simple item page Full metadata Statistics
 
dc.contributor.authorTokei, Zsolt
dc.contributor.authorCroes, Kristof
dc.contributor.authorDemuynck, Steven
dc.contributor.authorKauerauf, Thomas
dc.contributor.authorBeyer, Gerald
dc.contributor.imecauthorTokei, Zsolt
dc.contributor.imecauthorCroes, Kristof
dc.contributor.imecauthorDemuynck, Steven
dc.contributor.imecauthorBeyer, Gerald
dc.contributor.orcidimecCroes, Kristof::0000-0002-3955-0638
dc.date.accessioned2021-10-18T22:22:40Z
dc.date.available2021-10-18T22:22:40Z
dc.date.issued2010
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/18091
dc.source.beginpageF1.1
dc.source.conferenceMRS Spring Meeting Symposium F: Materials, Processes, Integration, and Reliability in Advanced Interconnects for Micro- and Nano
dc.source.conferencedate4/04/2010
dc.source.conferencelocationSan Francisco, CA USA
dc.title

Recent advances in copper based interconnect reliability

dc.typeMeeting abstract
dspace.entity.typePublication
Files
Publication available in collections:
Conference contributions