Publication:
Low-k materials etch and strip optimization for sub 0.25µm technology
Date
| dc.contributor.author | Gao, Teng | |
| dc.contributor.author | Gray, William | |
| dc.contributor.author | Van Hove, Marleen | |
| dc.contributor.author | Rosseel, Erik | |
| dc.contributor.author | Struyf, Herbert | |
| dc.contributor.author | Meynen, Herman | |
| dc.contributor.author | Vanhaelemeersch, Serge | |
| dc.contributor.author | Maex, Karen | |
| dc.contributor.imecauthor | Rosseel, Erik | |
| dc.contributor.imecauthor | Struyf, Herbert | |
| dc.contributor.imecauthor | Vanhaelemeersch, Serge | |
| dc.contributor.imecauthor | Maex, Karen | |
| dc.contributor.orcidimec | Vanhaelemeersch, Serge::0000-0003-2102-7395 | |
| dc.contributor.orcidimec | Struyf, Herbert::0000-0002-6782-5424 | |
| dc.date.accessioned | 2021-10-06T11:11:19Z | |
| dc.date.available | 2021-10-06T11:11:19Z | |
| dc.date.issued | 1999 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/3459 | |
| dc.source.beginpage | 53 | |
| dc.source.conference | Proceedings of the International Interconnect Technology Conference - IITC; San Francisco, CA, USA. | |
| dc.source.endpage | 55 | |
| dc.title | Low-k materials etch and strip optimization for sub 0.25µm technology | |
| dc.type | Proceedings paper | |
| dspace.entity.type | Publication | |
| Files | ||
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