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Effect of top power on low-k damage during oxygen strip in a TCP etch chamber
Publication:
Effect of top power on low-k damage during oxygen strip in a TCP etch chamber
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Date
2009
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Kunnen, Eddy
;
Shamiryan, Denis
;
Struyf, Herbert
;
Boullart, Werner
;
Baklanov, Mikhaïl
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1865
since deposited on 2021-10-17
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last month
Acq. date: 2025-12-15
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Metrics
Views
1865
since deposited on 2021-10-17
1
last month
Acq. date: 2025-12-15
Citations