Publication:

Exploration of etch step interactions in the dual patterning process for process modeling

Date

2008
Journal article
Simple item page Full metadata Statistics
 
dc.contributor.authorMelvin, Lawrence
dc.contributor.authorWard, Brian
dc.contributor.authorSong, H.
dc.contributor.authorRhie, S.U.
dc.contributor.authorLucas, K.D.
dc.contributor.authorWiaux, Vincent
dc.contributor.authorVerhaegen, Staf
dc.contributor.authorMaenhoudt, Mireille
dc.contributor.imecauthorWiaux, Vincent
dc.date.accessioned2021-10-17T08:55:59Z
dc.date.available2021-10-17T08:55:59Z
dc.date.embargo9999-12-31
dc.date.issued2008
dc.identifier.issn1071-1023
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/14146
dc.source.beginpage2434
dc.source.endpage2434
dc.source.issue6
dc.source.journalJournal of Vacuum Science and Technology B
dc.source.volume26
dc.title

Exploration of etch step interactions in the dual patterning process for process modeling

dc.typeJournal article
dspace.entity.typePublication
Files

Original bundle

Name:
17490.pdf
Size:
1.07 MB
Format:
Adobe Portable Document Format
Download
Publication available in collections:
Articles