Publication:
Atomic layer deposition of aluminum phosphate layers using tris(dimethylamino)phosphine as P-precursor
| cris.virtual.department | #PLACEHOLDER_PARENT_METADATA_VALUE# | |
| cris.virtual.orcid | 0000-0003-2467-1784 | |
| cris.virtualsource.department | 9688c6c3-6d95-4d12-b7a3-176d84ad0eef | |
| cris.virtualsource.orcid | 9688c6c3-6d95-4d12-b7a3-176d84ad0eef | |
| dc.contributor.author | Blomme, Ruben | |
| dc.contributor.author | Chalishazar, Aditya | |
| dc.contributor.author | Henderick, Lowie | |
| dc.contributor.author | Munnik, Frans | |
| dc.contributor.author | Meersschaut, Johan | |
| dc.contributor.author | Minjauw, Matthias M. | |
| dc.contributor.author | Detavernier, Christophe | |
| dc.contributor.author | Dendooven, Jolien | |
| dc.contributor.imecauthor | Meersschaut, Johan | |
| dc.contributor.orcidimec | Meersschaut, Johan::0000-0003-2467-1784 | |
| dc.date.accessioned | 2025-03-04T19:59:27Z | |
| dc.date.available | 2025-03-04T19:59:27Z | |
| dc.date.issued | 2025-MAR | |
| dc.description.wosFundingText | This work has received funding from the Special Research Fund BOF of Ghent University (GOA-01G01019, Starting Grant No. 01N14319). L.H. acknowledges the FWO (Research Foundation-Flanders; Fonds voor Wetenschappelijk Onderzoek) for a postdoctoral fellowship (No. 1254324N). R.B. acknowledges Geert Rampelberg, Zhiwei Zhang, and Nithin Poonkottil for the continued assistance in the lab to maintain the setup that was used for the deposition of the aluminum phosphate films. R.B. acknowledges Ewout Van de Velde (for the fruitful discussion on the reactivity of TDMAP and TMA), Ellen Blomme (for assistance in statistics), and Jorden de Bolle (for assistance on the XRD plotting and interpretation). Parts of this research were carried out at IBC at the Helmholtz-Zentrum Dresden-Rossendorf by a member of the Helmholtz Association. | |
| dc.identifier.doi | 10.1116/6.0004267 | |
| dc.identifier.issn | 0734-2101 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/45287 | |
| dc.publisher | A V S AMER INST PHYSICS | |
| dc.source.beginpage | 022409 | |
| dc.source.issue | 2 | |
| dc.source.journal | JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A | |
| dc.source.numberofpages | 12 | |
| dc.source.volume | 43 | |
| dc.subject.keywords | THIN-FILMS | |
| dc.subject.keywords | SPECTROSCOPY | |
| dc.subject.keywords | GLASSES | |
| dc.subject.keywords | GROWTH | |
| dc.title | Atomic layer deposition of aluminum phosphate layers using tris(dimethylamino)phosphine as P-precursor | |
| dc.type | Journal article | |
| dspace.entity.type | Publication | |
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