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Evaluation of megasonic cleaning for sub-90-nm technologies

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dc.contributor.authorVereecke, Guy
dc.contributor.authorHolsteyns, Frank
dc.contributor.authorArnauts, Sophia
dc.contributor.authorBeckx, Stephan
dc.contributor.authorJaenen, Patrick
dc.contributor.authorKenis, Karine
dc.contributor.authorLismont, Mark
dc.contributor.authorLux, Marcel
dc.contributor.authorVos, Rita
dc.contributor.authorSnow, Jim
dc.contributor.authorMertens, Paul
dc.contributor.imecauthorVereecke, Guy
dc.contributor.imecauthorHolsteyns, Frank
dc.contributor.imecauthorArnauts, Sophia
dc.contributor.imecauthorBeckx, Stephan
dc.contributor.imecauthorJaenen, Patrick
dc.contributor.imecauthorKenis, Karine
dc.contributor.imecauthorLismont, Mark
dc.contributor.imecauthorLux, Marcel
dc.contributor.imecauthorVos, Rita
dc.contributor.imecauthorMertens, Paul
dc.contributor.orcidimecVereecke, Guy::0000-0001-9058-9338
dc.date.accessioned2021-10-16T06:48:19Z
dc.date.available2021-10-16T06:48:19Z
dc.date.issued2005
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/11504
dc.source.beginpage141
dc.source.conferenceUltra Clean Processing of Silicon Surfaces VII: Proceedings of the 7th International Symposium
dc.source.conferencedate20/09/2004
dc.source.conferencelocationBrussels Belgium
dc.source.endpage146
dc.title

Evaluation of megasonic cleaning for sub-90-nm technologies

dc.typeProceedings paper
dspace.entity.typePublication
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