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Evaluation of DiMethylAminoGermaniumTriChloride as a novel carbon-dopant and germanium precursor for germanium and silicon germanium chemical vapor deposition

Date

2008
Proceedings Paper
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dc.contributor.authorLeys, Frederik
dc.contributor.authorLiu, Cong
dc.contributor.authorShi, Xiaoping
dc.contributor.authorLamare, B.
dc.contributor.authorTakeuchi, Shotaro
dc.contributor.authorSchaekers, Marc
dc.contributor.authorLoo, Roger
dc.contributor.authorWoelk, E.
dc.contributor.authorCaymax, Matty
dc.contributor.imecauthorSchaekers, Marc
dc.contributor.imecauthorLoo, Roger
dc.contributor.imecauthorCaymax, Matty
dc.contributor.orcidimecSchaekers, Marc::0000-0002-1496-7816
dc.contributor.orcidimecLoo, Roger::0000-0003-3513-6058
dc.date.accessioned2021-10-17T08:18:11Z
dc.date.available2021-10-17T08:18:11Z
dc.date.issued2008
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/14018
dc.source.beginpage159
dc.source.conferenceSiGe, Ge, and Related Compounds 3: Materials, Processing, and Devices
dc.source.conferencedate13/10/2008
dc.source.conferencelocationHonolulu, HI USA
dc.source.endpage162
dc.title

Evaluation of DiMethylAminoGermaniumTriChloride as a novel carbon-dopant and germanium precursor for germanium and silicon germanium chemical vapor deposition

dc.typeProceedings paper
dspace.entity.typePublication
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