Publication:

Influence of boron diffusion on ultra-thin oxides

Date

1997
Proceedings Paper
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dc.contributor.authorNigam, Tanya
dc.contributor.authorDepas, Michel
dc.contributor.authorHeyns, Marc
dc.contributor.authorSofield, C. F.
dc.contributor.authorMapeldoram, L.
dc.contributor.imecauthorHeyns, Marc
dc.date.accessioned2021-09-30T09:21:01Z
dc.date.available2021-09-30T09:21:01Z
dc.date.embargo9999-12-31
dc.date.issued1997
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/2057
dc.source.beginpage101
dc.source.conferenceMaterials Reliability in Microelectronics VII
dc.source.conferencedate31/03/1997
dc.source.conferencelocationSan Francisco, CA USA
dc.source.endpage106
dc.title

Influence of boron diffusion on ultra-thin oxides

dc.typeProceedings paper
dspace.entity.typePublication
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