Publication:

Accessing electronic properties of two-dimensional materials with gate-dependent micro four-point probe

 
cris.virtual.department#PLACEHOLDER_PARENT_METADATA_VALUE#
cris.virtual.department#PLACEHOLDER_PARENT_METADATA_VALUE#
cris.virtual.department#PLACEHOLDER_PARENT_METADATA_VALUE#
cris.virtual.department#PLACEHOLDER_PARENT_METADATA_VALUE#
cris.virtual.department#PLACEHOLDER_PARENT_METADATA_VALUE#
cris.virtual.department#PLACEHOLDER_PARENT_METADATA_VALUE#
cris.virtual.department#PLACEHOLDER_PARENT_METADATA_VALUE#
cris.virtual.department#PLACEHOLDER_PARENT_METADATA_VALUE#
cris.virtual.department#PLACEHOLDER_PARENT_METADATA_VALUE#
cris.virtual.department#PLACEHOLDER_PARENT_METADATA_VALUE#
cris.virtual.department#PLACEHOLDER_PARENT_METADATA_VALUE#
cris.virtual.orcid0000-0003-1461-5703
cris.virtual.orcid0000-0002-2856-3847
cris.virtual.orcid0000-0002-7503-8922
cris.virtual.orcid0000-0002-1577-6050
cris.virtual.orcid0000-0002-5270-1015
cris.virtual.orcid#PLACEHOLDER_PARENT_METADATA_VALUE#
cris.virtual.orcid0000-0002-6730-9542
cris.virtual.orcid0000-0001-8371-3222
cris.virtual.orcid0000-0002-6297-9547
cris.virtual.orcid0000-0001-5018-4539
cris.virtual.orcid0000-0002-4831-3159
cris.virtualsource.departmentab262bc7-16ae-4482-b008-e896f1bbfe6a
cris.virtualsource.department02fcd909-5a6a-45eb-bfcd-8e9db5163d50
cris.virtualsource.department9a3d60e7-3e8b-4366-b479-ea599b23d28b
cris.virtualsource.department8f2eba94-8478-45df-9820-022166ffc6fa
cris.virtualsource.department5283779c-b6ce-41f7-8a4e-2a73269535fd
cris.virtualsource.department0c60b739-e43a-453c-b032-600672f1833a
cris.virtualsource.department469e1399-f329-43a3-99ac-ef37c3eda6d3
cris.virtualsource.department51c894df-18d8-4358-a52a-d14ab7e9edb1
cris.virtualsource.department2fe54f44-957c-4bde-9a97-d5a9309c2c0b
cris.virtualsource.department81d20142-643b-4ea2-8f89-390fd699ef91
cris.virtualsource.department3e839b18-b9e5-46f9-95d4-760837031f7a
cris.virtualsource.orcidab262bc7-16ae-4482-b008-e896f1bbfe6a
cris.virtualsource.orcid02fcd909-5a6a-45eb-bfcd-8e9db5163d50
cris.virtualsource.orcid9a3d60e7-3e8b-4366-b479-ea599b23d28b
cris.virtualsource.orcid8f2eba94-8478-45df-9820-022166ffc6fa
cris.virtualsource.orcid5283779c-b6ce-41f7-8a4e-2a73269535fd
cris.virtualsource.orcid0c60b739-e43a-453c-b032-600672f1833a
cris.virtualsource.orcid469e1399-f329-43a3-99ac-ef37c3eda6d3
cris.virtualsource.orcid51c894df-18d8-4358-a52a-d14ab7e9edb1
cris.virtualsource.orcid2fe54f44-957c-4bde-9a97-d5a9309c2c0b
cris.virtualsource.orcid81d20142-643b-4ea2-8f89-390fd699ef91
cris.virtualsource.orcid3e839b18-b9e5-46f9-95d4-760837031f7a
dc.contributor.authorIntrona, Marco
dc.contributor.authorBogdanowicz, Janusz
dc.contributor.authorMedina Silva, Henry
dc.contributor.authorBanerjee, Sreetama
dc.contributor.authorKalhauge, Kristoffer G.
dc.contributor.authorWouters, Lennaert
dc.contributor.authorShi, Yuanyuan
dc.contributor.authorKim, Ju-Seok
dc.contributor.authorLin, Dennis
dc.contributor.authorAsselberghs, Inge
dc.contributor.authorAdelmann, Christoph
dc.contributor.authorAfanasiev, Valeri
dc.contributor.authorZandvliet, Harold J. W.
dc.contributor.authorCelano, Umberto
dc.contributor.imecauthorIntrona, Marco
dc.contributor.imecauthorBogdanowicz, Janusz
dc.contributor.imecauthorSilva, Henry Medina
dc.contributor.imecauthorBanerjee, Sreetama
dc.contributor.imecauthorWouters, Lennaert
dc.contributor.imecauthorKim, Ju-Seok
dc.contributor.imecauthorLin, Dennis
dc.contributor.imecauthorAsselberghs, Inge
dc.contributor.imecauthorAdelmann, Christoph
dc.contributor.imecauthorAfanas'Ev, Valeri V.
dc.contributor.imecauthorCelano, Umberto
dc.contributor.orcidimecIntrona, Marco::0000-0002-5270-1015
dc.contributor.orcidimecBogdanowicz, Janusz::0000-0002-7503-8922
dc.contributor.orcidimecBanerjee, Sreetama::0000-0002-6297-9547
dc.contributor.orcidimecWouters, Lennaert::0000-0002-6730-9542
dc.contributor.orcidimecLin, Dennis::0000-0002-1577-6050
dc.contributor.orcidimecAsselberghs, Inge::0000-0001-8371-3222
dc.contributor.orcidimecAdelmann, Christoph::0000-0002-4831-3159
dc.contributor.orcidimecCelano, Umberto::0000-0002-2856-3847
dc.date.accessioned2024-12-17T17:17:05Z
dc.date.available2024-12-17T17:17:05Z
dc.date.issued2025
dc.description.abstractThe attractive properties of 2D materials and transition metal dichalcogenides hold great potential for their use in future, ultra-scaled electronic applications. Although growth processes are increasingly trending towards highly scalable, industry compatible procedures, a fast, reliable, and efficient characterization method for pristine samples is still missing. In this study, we propose the use of back-gated micro four-point probe (M4PP) as a qualitative characterization technique for the early screening of pristine samples. We develop a custom procedure to probe MoS2 samples with different numbers of layers and grain orientations, showing the effects of probe landing and giving an interpretation of the electrical contact between the probe pins and the material. Using the M4PP data we employ a simple and effective parallel capacitor model to extract the charge carriers’ concentration (nc) and the field-effect mobility (μFE). The model is then tested by comparing it with data obtained from back-gated field-effect transistors manufactured on the same material. The comparison provides a striking qualitative similarity, proving the usefulness of back-gated M4PP as characterization method for MoS2 samples.
dc.identifier.doi10.1088/2053-1583/ad9843
dc.identifier.issn2053-1583
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/44988
dc.publisherIOP Publishing Ltd
dc.source.beginpage015015
dc.source.issue1
dc.source.journal2D MATERIALS
dc.source.numberofpages9
dc.source.volume12
dc.subject.keywordsGRAPHENE
dc.title

Accessing electronic properties of two-dimensional materials with gate-dependent micro four-point probe

dc.typeJournal article
dspace.entity.typePublication
Files
Publication available in collections: