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Articles
Resolution-linewidth roughness-sensitivity performance tradeoffs for an extreme ultraviolet polymer bound photo-acid generator resist
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Resolution-linewidth roughness-sensitivity performance tradeoffs for an extreme ultraviolet polymer bound photo-acid generator resist
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Date
2011
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Gronheid, Roel
;
Vaglio Pret, Alessandro
;
Rathsack, Benjamin
;
Hooge, Joshua
;
Scheer, Steven
;
Nafus, Kathleen
;
Shite, Hideo
;
Kitano, Junichi
Journal
Journal of Micro/Nanolithography MEMS and MOEMS
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1975
since deposited on 2021-10-19
1
last month
Acq. date: 2025-12-11
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Metrics
Views
1975
since deposited on 2021-10-19
1
last month
Acq. date: 2025-12-11
Citations