Publication:

Extremely low temperature selective epitaxial processes for advanced CMOS applications

Date

2019
Proceedings Paper
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dc.contributor.authorHikavyy, Andriy
dc.contributor.authorPorret, Clément
dc.contributor.authorRosseel, Erik
dc.contributor.authorFavia, Paola
dc.contributor.authorLoo, Roger
dc.contributor.imecauthorHikavyy, Andriy
dc.contributor.imecauthorPorret, Clément
dc.contributor.imecauthorRosseel, Erik
dc.contributor.imecauthorFavia, Paola
dc.contributor.imecauthorLoo, Roger
dc.contributor.orcidimecHikavyy, Andriy::0000-0002-8201-075X
dc.contributor.orcidimecPorret, Clément::0000-0002-4561-348X
dc.contributor.orcidimecFavia, Paola::0000-0002-1019-3497
dc.contributor.orcidimecLoo, Roger::0000-0003-3513-6058
dc.date.accessioned2021-10-27T10:29:17Z
dc.date.available2021-10-27T10:29:17Z
dc.date.embargo9999-12-31
dc.date.issued2019
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/33161
dc.source.beginpage661
dc.source.conferenceExtended Abstacts of the 2019 International Conference on Solid State Devices and Materials - SSDM
dc.source.conferencedate2/09/2019
dc.source.conferencelocationNagoya Japan
dc.source.endpage662
dc.title

Extremely low temperature selective epitaxial processes for advanced CMOS applications

dc.typeProceedings paper
dspace.entity.typePublication
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