Improvements in the measurement of local critical dimension uniformity for holes and pillars

dc.contributor.author	Mack, Chris A.
dc.contributor.author	Delvaux, Christie
dc.contributor.author	De Simone, Danilo
dc.contributor.author	Lorusso, Gian
dc.contributor.imecauthor	Delvaux, Christie
dc.contributor.imecauthor	De Simone, Danilo
dc.contributor.imecauthor	Lorusso, Gian
dc.contributor.orcidimec	De Simone, Danilo::0000-0003-3927-5207
dc.contributor.orcidimec	Lorusso, Gian::0000-0003-3498-5082
dc.date.accessioned	2024-04-16T08:55:08Z
dc.date.available	2024-01-13T17:47:50Z
dc.date.available	2024-04-16T08:55:08Z
dc.date.issued	2023
dc.identifier.doi	10.1117/12.2688355
dc.identifier.eisbn	978-1-5106-6749-5
dc.identifier.isbn	978-1-5106-6748-8
dc.identifier.issn	0277-786X
dc.identifier.uri	https://imec-publications.be/handle/20.500.12860/43404
dc.publisher	SPIE-INT SOC OPTICAL ENGINEERING
dc.source.beginpage	Art. 127500G
dc.source.conference	International Conference on Extreme Ultraviolet Lithography
dc.source.conferencedate	OCT 02-05, 2023
dc.source.conferencelocation	Monterey
dc.source.journal	Proceedings of SPIE
dc.source.numberofpages	8
dc.source.volume	12750
dc.title	Improvements in the measurement of local critical dimension uniformity for holes and pillars
dc.type	Proceedings paper
dspace.entity.type	Publication
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