Publication:

Performance and leakage optimization in carbon and fluorine C0-implanted pMOSFETs

Date

2008
Proceedings Paper
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dc.contributor.authorPawlak, Bartek
dc.contributor.authorDuffy, Ray
dc.contributor.authorHooker, Jacob
dc.contributor.authorHoffmann, Thomas
dc.contributor.authorFelch, S.B.
dc.contributor.authorEyben, Pierre
dc.contributor.authorAbsil, Philippe
dc.contributor.authorLander, Rob
dc.contributor.imecauthorPawlak, Bartek
dc.contributor.imecauthorEyben, Pierre
dc.contributor.imecauthorAbsil, Philippe
dc.date.accessioned2021-10-17T09:44:27Z
dc.date.available2021-10-17T09:44:27Z
dc.date.embargo9999-12-31
dc.date.issued2008
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/14296
dc.source.beginpage30
dc.source.conferenceInternational Symposium on VLSI Technology, Systems and Applications - VLSI-TSA
dc.source.conferencedate21/04/2008
dc.source.conferencelocationHsinchu Taiwan
dc.source.endpage31
dc.title

Performance and leakage optimization in carbon and fluorine C0-implanted pMOSFETs

dc.typeProceedings paper
dspace.entity.typePublication
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