Impact of high-K gate stack material with metal gates on LF noise in n- and p MOSFETs

dc.contributor.author	Srinivasan, Purushothaman
dc.contributor.author	Simoen, Eddy
dc.contributor.author	Pantisano, Luigi
dc.contributor.author	Claeys, Cor
dc.contributor.author	Misra, D.
dc.contributor.imecauthor	Simoen, Eddy
dc.contributor.orcidimec	Simoen, Eddy::0000-0002-5218-4046
dc.date.accessioned	2021-10-16T05:22:34Z
dc.date.available	2021-10-16T05:22:34Z
dc.date.embargo	9999-12-31
dc.date.issued	2005
dc.identifier.uri	https://imec-publications.be/handle/20.500.12860/11262
dc.source.beginpage	226
dc.source.endpage	229
dc.source.journal	Microelectronic Engineering
dc.source.volume	80
dc.title	Impact of high-K gate stack material with metal gates on LF noise in n- and p MOSFETs
dc.type	Journal article
dspace.entity.type	Publication
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