Publication:

Effect of additives on the removal efficiency of photoresist by ozone/Di-water processes; experimental study

Date

2003
Proceedings Paper
Simple item page Full metadata Statistics
 
dc.contributor.authorVankerckhoven, H.
dc.contributor.authorDe Smedt, Frank
dc.contributor.authorClaes, Martine
dc.contributor.authorDe Gendt, Stefan
dc.contributor.authorHeyns, Marc
dc.contributor.authorVinckier, Chris
dc.contributor.imecauthorClaes, Martine
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.imecauthorHeyns, Marc
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.date.accessioned2021-10-15T07:32:18Z
dc.date.available2021-10-15T07:32:18Z
dc.date.embargo9999-12-31
dc.date.issued2003
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/8342
dc.source.beginpage101
dc.source.conferenceUltra Clean Processing of Silicon Surfaces 2002 - UCPSS
dc.source.conferencedate16/09/2002
dc.source.conferencelocationOostende Belgium
dc.source.endpage105
dc.title

Effect of additives on the removal efficiency of photoresist by ozone/Di-water processes; experimental study

dc.typeProceedings paper
dspace.entity.typePublication
Files

Original bundle

Name:
7806.pdf
Size:
216.92 KB
Format:
Adobe Portable Document Format
Download
Publication available in collections:
Conference contributions