Electric stress-induced degradation of thin oxide layers and its impact on device reliability

dc.contributor.author	Degraeve, Robin
dc.contributor.author	Kaczer, Ben
dc.contributor.author	Roussel, Philippe
dc.contributor.author	Groeseneken, Guido
dc.contributor.imecauthor	Degraeve, Robin
dc.contributor.imecauthor	Kaczer, Ben
dc.contributor.imecauthor	Roussel, Philippe
dc.contributor.imecauthor	Groeseneken, Guido
dc.contributor.orcidimec	Kaczer, Ben::0000-0002-1484-4007
dc.contributor.orcidimec	Roussel, Philippe::0000-0002-0402-8225
dc.date.accessioned	2021-10-14T21:27:34Z
dc.date.available	2021-10-14T21:27:34Z
dc.date.issued	2002
dc.identifier.uri	https://imec-publications.be/handle/20.500.12860/6245
dc.source.beginpage	475
dc.source.conference	Semiconductor Silicon 2002. Proceedings of the 9th International Symposium on Silicon Materials Science and Technology
dc.source.conferencedate	13/05/2002
dc.source.conferencelocation	Philadelphia, PA USA
dc.source.endpage	488
dc.title	Electric stress-induced degradation of thin oxide layers and its impact on device reliability
dc.type	Proceedings paper
dspace.entity.type	Publication
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