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Cu electrodeposition on resistive substrates in alkaline chemistry: effect of current density and wafer RPM
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Cu electrodeposition on resistive substrates in alkaline chemistry: effect of current density and wafer RPM
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Date
2011
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Armini, Silvia
Journal
Journal of the Electrochemical Society
Abstract
Description
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1853
since deposited on 2021-10-19
Acq. date: 2025-12-15
Citations
Metrics
Views
1853
since deposited on 2021-10-19
Acq. date: 2025-12-15
Citations