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GAFM characterization of the dependence of HfAlOx electrical behavior on post-deposition annealing temperature
Publication:
GAFM characterization of the dependence of HfAlOx electrical behavior on post-deposition annealing temperature
Date
2004
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Blasco, X.
;
Petry, Jasmine
;
Nafria, M.
;
Aymerich, X.
;
Richard, Olivier
;
Vandervorst, Wilfried
Journal
Microelectronic Engineering
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2047
since deposited on 2021-10-15
Acq. date: 2025-10-23
Citations
Metrics
Views
2047
since deposited on 2021-10-15
Acq. date: 2025-10-23
Citations