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Low frequency noise analysis for post-treatment of replacement metal gate FinFET
Publication:
Low frequency noise analysis for post-treatment of replacement metal gate FinFET
Date
2013
Journal article
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Lee, Jae Woo
;
Simoen, Eddy
;
Veloso, Anabela
;
Cho, Moon Ju
;
Arimura, Hiroaki
;
Boccardi, Guillaume
;
Ragnarsson, Lars-Ake
;
Chiarella, Thomas
;
Horiguchi, Naoto
;
Thean, Aaron
;
Groeseneken, Guido
Journal
IEEE Transactions on Electron Devices
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1945
since deposited on 2021-10-21
Acq. date: 2025-10-23
Citations
Metrics
Views
1945
since deposited on 2021-10-21
Acq. date: 2025-10-23
Citations