Publication:

High throughput measurement techniques for wafer level yield inspection of MEMS devices

Date

2008
Proceedings Paper
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dc.contributor.authorVarela Pedreira, Olalla
dc.contributor.authorLauwagie, Tom
dc.contributor.authorDe Coster, Jeroen
dc.contributor.authorHaspeslagh, Luc
dc.contributor.authorWitvrouw, Ann
dc.contributor.authorDe Wolf, Ingrid
dc.contributor.imecauthorVarela Pedreira, Olalla
dc.contributor.imecauthorDe Coster, Jeroen
dc.contributor.imecauthorHaspeslagh, Luc
dc.contributor.imecauthorDe Wolf, Ingrid
dc.contributor.orcidimecDe Wolf, Ingrid::0000-0003-3822-5953
dc.date.accessioned2021-10-17T12:21:26Z
dc.date.available2021-10-17T12:21:26Z
dc.date.issued2008
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/14726
dc.source.beginpage71550M
dc.source.conference9th International Symposium on Laser Metrology
dc.source.conferencedate30/06/2008
dc.source.conferencelocationSingapore
dc.title

High throughput measurement techniques for wafer level yield inspection of MEMS devices

dc.typeProceedings paper
dspace.entity.typePublication
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