Publication:
Cleaning and damage performance of single wafer cleaning tools using physcial removal forces
Date
| dc.contributor.author | Pacco, Antoine | |
| dc.contributor.author | Halder, Sandip | |
| dc.contributor.author | Kenis, Karine | |
| dc.contributor.author | Bearda, Twan | |
| dc.contributor.author | Mertens, Paul | |
| dc.contributor.imecauthor | Pacco, Antoine | |
| dc.contributor.imecauthor | Halder, Sandip | |
| dc.contributor.imecauthor | Kenis, Karine | |
| dc.contributor.imecauthor | Mertens, Paul | |
| dc.contributor.orcidimec | Halder, Sandip::0000-0002-6314-2685 | |
| dc.date.accessioned | 2021-10-18T01:22:29Z | |
| dc.date.available | 2021-10-18T01:22:29Z | |
| dc.date.issued | 2009 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/15959 | |
| dc.source.beginpage | 2092 | |
| dc.source.conference | 216th ECS Meeting | |
| dc.source.conferencedate | 4/10/2009 | |
| dc.source.conferencelocation | Vienna Austria | |
| dc.title | Cleaning and damage performance of single wafer cleaning tools using physcial removal forces | |
| dc.type | Meeting abstract | |
| dspace.entity.type | Publication | |
| Files | ||
| Publication available in collections: |