Current and future requirements for metrology and inspection for advanced patterning

dc.contributor.author	Leray, Philippe
dc.contributor.author	Wong, Patrick
dc.contributor.author	Halder, Sandip
dc.contributor.author	Foubert, Philippe
dc.contributor.imecauthor	Leray, Philippe
dc.contributor.imecauthor	Wong, Patrick
dc.contributor.imecauthor	Halder, Sandip
dc.contributor.imecauthor	Foubert, Philippe
dc.contributor.orcidimec	Wong, Patrick::0000-0003-3605-9680
dc.contributor.orcidimec	Halder, Sandip::0000-0002-6314-2685
dc.date.accessioned	2021-10-23T12:07:32Z
dc.date.available	2021-10-23T12:07:32Z
dc.date.issued	2016
dc.identifier.uri	https://imec-publications.be/handle/20.500.12860/26891
dc.identifier.url	http://imnc.jp/invited2016.html
dc.source.conference	29th International Microprocesses and Nanotechnology Conference - IMNC
dc.source.conferencedate	8/11/2016
dc.source.conferencelocation	Kyoto Japan
dc.title	Current and future requirements for metrology and inspection for advanced patterning
dc.type	Proceedings paper
dspace.entity.type	Publication
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