Publication:

Selective area growth of InP on on-axis Si(001) substrates with low antiphase boundary formation

Date

2012
Journal article
https://doi.org/10.1149/2.051203jes
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dc.contributor.authorLoo, Roger
dc.contributor.authorWang, Gang
dc.contributor.authorOrzali, Tommaso
dc.contributor.authorWaldron, Niamh
dc.contributor.authorMerckling, Clement
dc.contributor.authorLeys, Maarten
dc.contributor.authorRichard, Olivier
dc.contributor.authorBender, Hugo
dc.contributor.authorEyben, Pierre
dc.contributor.authorVandervorst, Wilfried
dc.contributor.authorCaymax, Matty
dc.contributor.imecauthorLoo, Roger
dc.contributor.imecauthorWaldron, Niamh
dc.contributor.imecauthorMerckling, Clement
dc.contributor.imecauthorRichard, Olivier
dc.contributor.imecauthorBender, Hugo
dc.contributor.imecauthorEyben, Pierre
dc.contributor.imecauthorVandervorst, Wilfried
dc.contributor.imecauthorCaymax, Matty
dc.contributor.orcidimecLoo, Roger::0000-0003-3513-6058
dc.contributor.orcidimecMerckling, Clement::0000-0003-3084-2543
dc.contributor.orcidimecRichard, Olivier::0000-0002-3994-8021
dc.date.accessioned2021-10-20T12:58:37Z
dc.date.available2021-10-20T12:58:37Z
dc.date.issued2012
dc.identifier.doi10.1149/2.051203jes
dc.identifier.issn0013-4651
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/21060
dc.source.beginpageH260
dc.source.endpageH265
dc.source.issue3
dc.source.journalJournal of the Electrochemical Society
dc.source.volume159
dc.title

Selective area growth of InP on on-axis Si(001) substrates with low antiphase boundary formation

dc.typeJournal article
dspace.entity.typePublication
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