Wet chemical processing of Ge in acidic H2O2 solution: nanoscale etching and surface chemistry

dc.contributor.author	Abrenica, Graniel
dc.contributor.author	Fingerle, Mathias
dc.contributor.author	Lebedev, Mikhail
dc.contributor.author	Arnauts, Sophia
dc.contributor.author	Mayer, Thomas
dc.contributor.author	Holsteyns, Frank
dc.contributor.author	De Gendt, Stefan
dc.contributor.author	van Dorp, Dennis
dc.contributor.imecauthor	Abrenica, Graniel
dc.contributor.imecauthor	Arnauts, Sophia
dc.contributor.imecauthor	Holsteyns, Frank
dc.contributor.imecauthor	De Gendt, Stefan
dc.contributor.imecauthor	van Dorp, Dennis
dc.contributor.orcidimec	De Gendt, Stefan::0000-0003-3775-3578
dc.contributor.orcidimec	van Dorp, Dennis::0000-0002-1085-4232
dc.date.accessioned	2021-10-28T20:08:58Z
dc.date.available	2021-10-28T20:08:58Z
dc.date.issued	2020
dc.identifier.issn	2162-8769
dc.identifier.uri	https://imec-publications.be/handle/20.500.12860/34586
dc.identifier.url	https://doi.org/10.1149/2162-8777/abb1c5
dc.source.beginpage	84002
dc.source.issue	8
dc.source.journal	ECS Journal of Solid State Science and Technology
dc.source.volume	9
dc.title	Wet chemical processing of Ge in acidic H2O2 solution: nanoscale etching and surface chemistry
dc.type	Journal article
dspace.entity.type	Publication
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