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Investigation of fluorine in dry ultrathin silicon oxides

Date

2001
Journal article
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dc.contributor.authorVereecke, Guy
dc.contributor.authorRöhr, Erika
dc.contributor.authorCarter, Richard
dc.contributor.authorConard, Thierry
dc.contributor.authorDe Witte, Hilde
dc.contributor.authorHeyns, Marc
dc.contributor.imecauthorVereecke, Guy
dc.contributor.imecauthorConard, Thierry
dc.contributor.imecauthorHeyns, Marc
dc.contributor.orcidimecVereecke, Guy::0000-0001-9058-9338
dc.contributor.orcidimecConard, Thierry::0000-0002-4298-5851
dc.date.accessioned2021-10-14T18:18:04Z
dc.date.available2021-10-14T18:18:04Z
dc.date.issued2001
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/5806
dc.source.beginpage2108
dc.source.endpage2113
dc.source.issue6
dc.source.journalJournal of Vacuum Science & Technology B
dc.source.volume19
dc.title

Investigation of fluorine in dry ultrathin silicon oxides

dc.typeJournal article
dspace.entity.typePublication
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