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Adsorption isobars of fluorocarbon compounds selected for cryogenic etching of low-k materials

Date

2015
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dc.contributor.authorRezvanov, A.
dc.contributor.authorMogilnikov, K.
dc.contributor.authorGutshin, O.
dc.contributor.authorGornev, E.
dc.contributor.authorKrasnikov, G.
dc.contributor.authorZhang, Liping
dc.contributor.authorDussarrat, C.
dc.contributor.authorde Marneffe, Jean-Francois
dc.contributor.authorBaklanov, Mikhaïl
dc.contributor.imecauthorZhang, Liping
dc.contributor.imecauthorde Marneffe, Jean-Francois
dc.date.accessioned2021-10-22T22:14:13Z
dc.date.available2021-10-22T22:14:13Z
dc.date.issued2015
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/25817
dc.source.beginpageBB2.03
dc.source.conferenceSpring MRS Meeting Symposium BB: Innovative Interconnects/Electrodes for Advances Devices, Flexible and Green Energy Electronics
dc.source.conferencedate6/04/2015
dc.source.conferencelocationSan Francisco, CA USA
dc.title

Adsorption isobars of fluorocarbon compounds selected for cryogenic etching of low-k materials

dc.typeMeeting abstract
dspace.entity.typePublication
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