Publication:

Process window discovery methodology development for advanced lithography

Date

2016
Proceedings Paper
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dc.contributor.authorVan Den Heuvel, Dieter
dc.contributor.authorFoubert, Philippe
dc.contributor.authorBaudemprez, Bart
dc.contributor.authorLee, Angelica
dc.contributor.authorCross, Andrew
dc.contributor.authorSao, Kaushik
dc.contributor.authorHaque, Naoshin
dc.contributor.authorParisi, Paolo
dc.contributor.authorBaris, Oksin
dc.contributor.imecauthorVan Den Heuvel, Dieter
dc.contributor.imecauthorFoubert, Philippe
dc.contributor.imecauthorBaudemprez, Bart
dc.contributor.imecauthorCross, Andrew
dc.contributor.imecauthorParisi, Paolo
dc.date.accessioned2021-10-23T15:59:12Z
dc.date.available2021-10-23T15:59:12Z
dc.date.embargo9999-12-31
dc.date.issued2016
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/27446
dc.identifier.urlhttp://ieeexplore.ieee.org/document/7491105/
dc.source.beginpage65
dc.source.conference27th Annual SEMI Advanced Semiconductor Manufacturing Conference - ASMC
dc.source.conferencedate16/05/2016
dc.source.conferencelocationSaratoga Springs, NY USA
dc.source.endpage71
dc.title

Process window discovery methodology development for advanced lithography

dc.typeProceedings paper
dspace.entity.typePublication
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