Publication:
The role of TXRF in the introduction of high-k materials into IC processing
Date
| dc.contributor.author | Hellin, David | |
| dc.contributor.author | Onsia, Bart | |
| dc.contributor.author | Delabie, Annelies | |
| dc.contributor.author | De Gendt, Stefan | |
| dc.contributor.author | Vinckier, Chris | |
| dc.contributor.imecauthor | Hellin, David | |
| dc.contributor.imecauthor | Onsia, Bart | |
| dc.contributor.imecauthor | Delabie, Annelies | |
| dc.contributor.imecauthor | De Gendt, Stefan | |
| dc.contributor.orcidimec | De Gendt, Stefan::0000-0003-3775-3578 | |
| dc.date.accessioned | 2021-10-15T13:46:25Z | |
| dc.date.available | 2021-10-15T13:46:25Z | |
| dc.date.issued | 2004 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/9016 | |
| dc.source.beginpage | 199 | |
| dc.source.conference | Physics and Technology of High-k Gate Dielectrics II | |
| dc.source.conferencedate | 12/10/2003 | |
| dc.source.conferencelocation | Orlando, FL USA | |
| dc.source.endpage | 211 | |
| dc.title | The role of TXRF in the introduction of high-k materials into IC processing | |
| dc.type | Proceedings paper | |
| dspace.entity.type | Publication | |
| Files | ||
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