Publication:

Importance of determining the polysilicon dopant profile during process development

Date

1996
Journal article
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dc.contributor.authorDebusschere, Ingrid
dc.contributor.authorDeferm, Ludo
dc.contributor.authorVandervorst, Wilfried
dc.contributor.imecauthorDebusschere, Ingrid
dc.contributor.imecauthorDeferm, Ludo
dc.contributor.imecauthorVandervorst, Wilfried
dc.date.accessioned2021-09-29T14:24:59Z
dc.date.available2021-09-29T14:24:59Z
dc.date.embargo9999-12-31
dc.date.issued1996
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/1185
dc.source.beginpage265
dc.source.endpage271
dc.source.issue1
dc.source.journalJournal of Vacuum Science and Technology B
dc.source.volume14
dc.title

Importance of determining the polysilicon dopant profile during process development

dc.typeJournal article
dspace.entity.typePublication
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