Publication:

Comparison between experimental and simulated strain profiles in Ge channels with embedded source/drain stressors

Date

2014
Meeting abstract
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dc.contributor.authorBuhler, Rudolf
dc.contributor.authorEneman, Geert
dc.contributor.authorFavia, Paola
dc.contributor.authorBender, Hugo
dc.contributor.authorVincent, Benjamin
dc.contributor.authorHikavyy, Andriy
dc.contributor.authorLoo, Roger
dc.contributor.authorMartino, Joao
dc.contributor.authorClaeys, Cor
dc.contributor.authorSimoen, Eddy
dc.contributor.authorCollaert, Nadine
dc.contributor.authorThean, Aaron
dc.contributor.imecauthorEneman, Geert
dc.contributor.imecauthorFavia, Paola
dc.contributor.imecauthorBender, Hugo
dc.contributor.imecauthorVincent, Benjamin
dc.contributor.imecauthorHikavyy, Andriy
dc.contributor.imecauthorLoo, Roger
dc.contributor.imecauthorSimoen, Eddy
dc.contributor.imecauthorCollaert, Nadine
dc.contributor.imecauthorThean, Aaron
dc.contributor.orcidimecEneman, Geert::0000-0002-5849-3384
dc.contributor.orcidimecFavia, Paola::0000-0002-1019-3497
dc.contributor.orcidimecHikavyy, Andriy::0000-0002-8201-075X
dc.contributor.orcidimecLoo, Roger::0000-0003-3513-6058
dc.contributor.orcidimecSimoen, Eddy::0000-0002-5218-4046
dc.contributor.orcidimecCollaert, Nadine::0000-0002-8062-3165
dc.date.accessioned2021-10-22T00:50:22Z
dc.date.available2021-10-22T00:50:22Z
dc.date.issued2014
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/23590
dc.source.conferenceE-MRS Spring Meeting Symposium X: Materials Research for Group IV Semiconductors
dc.source.conferencedate16/05/2014
dc.source.conferencelocationLille France
dc.title

Comparison between experimental and simulated strain profiles in Ge channels with embedded source/drain stressors

dc.typeMeeting abstract
dspace.entity.typePublication
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