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Strategies to improve linewidth control for 0.25 µm and 0.18 µm devices

Date

1996
Journal article
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dc.contributor.authorOp de Beeck, Maaike
dc.contributor.authorRonse, Kurt
dc.contributor.authorGoethals, Mieke
dc.contributor.authorVandenberghe, Geert
dc.contributor.authorBruggeman, B.
dc.contributor.authorVan den hove, Luc
dc.contributor.imecauthorOp de Beeck, Maaike
dc.contributor.imecauthorRonse, Kurt
dc.contributor.imecauthorVandenberghe, Geert
dc.contributor.imecauthorVan den hove, Luc
dc.contributor.orcidimecOp de Beeck, Maaike::0000-0002-2700-6432
dc.contributor.orcidimecRonse, Kurt::0000-0003-0803-4267
dc.date.accessioned2021-09-29T15:16:08Z
dc.date.available2021-09-29T15:16:08Z
dc.date.embargo9999-12-31
dc.date.issued1996
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/1400
dc.source.beginpage399
dc.source.endpage424
dc.source.issue3
dc.source.journalJournal of Photopolymer Science and Technology
dc.source.volume9
dc.title

Strategies to improve linewidth control for 0.25 µm and 0.18 µm devices

dc.typeJournal article
dspace.entity.typePublication
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