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Effect of oxide and W-CMP on the material properties and electromigration behaviour of layered aluminum metallisations
Publication:
Effect of oxide and W-CMP on the material properties and electromigration behaviour of layered aluminum metallisations
Date
2000
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Heyvaert, Ilse
;
Van Hove, Marleen
;
Witvrouw, Ann
;
Maex, Karen
;
Saerens, Annelies
;
Roussel, Philippe
;
Bender, Hugo
Journal
Microelectronic Engineering
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1960
since deposited on 2021-10-14
Acq. date: 2025-10-24
Citations
Metrics
Views
1960
since deposited on 2021-10-14
Acq. date: 2025-10-24
Citations