Skip to content
Institutional repository
Communities & Collections
Browse all items
Scientific publications
Open knowledge
Log In
imec Publications
Articles
HfO2 based High-k inter-gate dielectrics for planar NAND flash memory
Publication:
HfO2 based High-k inter-gate dielectrics for planar NAND flash memory
Copy permalink
Date
2014
Journal article
Simple item page
Full metadata
Statistics
Loading...
Loading...
Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Breuil, Laurent
;
Lisoni, Judit
;
Blomme, Pieter
;
Van den Bosch, Geert
;
Van Houdt, Jan
Journal
IEEE Electron Device Letters
Abstract
Description
Metrics
Views
1832
since deposited on 2021-10-22
Acq. date: 2025-12-15
Citations
Metrics
Views
1832
since deposited on 2021-10-22
Acq. date: 2025-12-15
Citations