Publication:

Point of use HF purification for Si surface preparation

Date

1996
Proceedings Paper
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dc.contributor.authorFyen, Wim
dc.contributor.authorMouche, Laurent
dc.contributor.authorMeuris, Marc
dc.contributor.authorHeyns, Marc
dc.contributor.authorZahka, J.
dc.contributor.imecauthorMeuris, Marc
dc.contributor.imecauthorHeyns, Marc
dc.contributor.orcidimecMeuris, Marc::0000-0002-9580-6810
dc.date.accessioned2021-09-29T14:29:39Z
dc.date.available2021-09-29T14:29:39Z
dc.date.embargo9999-12-31
dc.date.issued1996
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/1226
dc.source.beginpage131
dc.source.conferenceProceedings of the 3rd International Symposium on Ultra Clean Processing of Silicon Surfaces - UCPSS
dc.source.conferencedate23/09/1996
dc.source.conferencelocationAntwerpen Belgium
dc.source.endpage134
dc.title

Point of use HF purification for Si surface preparation

dc.typeProceedings paper
dspace.entity.typePublication
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