Publication:

Optimization of cleaning processes for 100 nm and smaller design rules

Date

2001
Presentation
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dc.contributor.authorXu, Kaidong
dc.contributor.authorVos, Rita
dc.contributor.authorHolsteyns, Frank
dc.contributor.authorKenis, Karine
dc.contributor.authorVereecke, Guy
dc.contributor.authorMertens, Paul
dc.contributor.authorHeyns, Marc
dc.contributor.imecauthorVos, Rita
dc.contributor.imecauthorHolsteyns, Frank
dc.contributor.imecauthorKenis, Karine
dc.contributor.imecauthorVereecke, Guy
dc.contributor.imecauthorMertens, Paul
dc.contributor.imecauthorHeyns, Marc
dc.contributor.orcidimecVereecke, Guy::0000-0001-9058-9338
dc.date.accessioned2021-10-14T18:26:56Z
dc.date.available2021-10-14T18:26:56Z
dc.date.issued2001
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/5849
dc.source.conferenceSemaTech Yield Management Seminar; August 2001; Singapore and Taiwan.
dc.source.conferencelocation
dc.title

Optimization of cleaning processes for 100 nm and smaller design rules

dc.typeOral presentation
dspace.entity.typePublication
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