Publication:

Two-level MOL and VHV routing style to enable extreme height scaling beyond 2nm technology node

Date

2021
Proceedings Paper
https://doi.org/10.1109/IITC51362.2021.9537557
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dc.contributor.authorChehab, Bilal
dc.contributor.authorZografos, Odysseas
dc.contributor.authorDentoni Litta, Eugenio
dc.contributor.authorAhmed, Zubair
dc.contributor.authorSchuddinck, Pieter
dc.contributor.authorJang, Doyoung
dc.contributor.authorHellings, Geert
dc.contributor.authorSpessot, Alessio
dc.contributor.authorWeckx, Pieter
dc.contributor.authorRyckaert, Julien
dc.contributor.imecauthorChehab, Bilal
dc.contributor.imecauthorZografos, Odysseas
dc.contributor.imecauthorDentoni Litta, Eugenio
dc.contributor.imecauthorAhmed, Zubair
dc.contributor.imecauthorSchuddinck, Pieter
dc.contributor.imecauthorJang, Doyoung
dc.contributor.imecauthorHellings, Geert
dc.contributor.imecauthorSpessot, Alessio
dc.contributor.imecauthorWeckx, Pieter
dc.contributor.imecauthorRyckaert, Julien
dc.contributor.orcidimecZografos, Odysseas::0000-0002-9998-8009
dc.contributor.orcidimecHellings, Geert::0000-0002-5376-2119
dc.contributor.orcidimecSchuddinck, Pieter::0000-0003-1893-3135
dc.contributor.orcidimecDentoni Litta, Eugenio::0000-0003-0333-376X
dc.date.accessioned2022-06-17T07:57:39Z
dc.date.available2022-05-05T02:17:26Z
dc.date.available2022-05-17T06:25:54Z
dc.date.available2022-06-17T07:57:39Z
dc.date.embargo9999-12-31
dc.date.issued2021
dc.identifier.doi10.1109/IITC51362.2021.9537557
dc.identifier.eisbn978-1-7281-7632-1
dc.identifier.issn2380-632X
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/39737
dc.publisherIEEE
dc.source.conferenceIEEE International Interconnect Technology Conference (IITC)
dc.source.conferencedateJUL 06-09, 2021
dc.source.conferencelocationVirtual conference
dc.source.journalConference proceedings
dc.source.numberofpages3
dc.title

Two-level MOL and VHV routing style to enable extreme height scaling beyond 2nm technology node

dc.typeProceedings paper
dspace.entity.typePublication
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