Publication:
Non-selective and selective thin SiGe strain-relaxed buffer layers: growth and carbon-induced relaxation
Date
| dc.contributor.author | Caymax, Matty | |
| dc.contributor.author | Delhougne, Romain | |
| dc.contributor.author | Ries, Michael | |
| dc.contributor.author | Luysberg, Martina | |
| dc.contributor.author | Loo, Roger | |
| dc.contributor.imecauthor | Caymax, Matty | |
| dc.contributor.imecauthor | Delhougne, Romain | |
| dc.contributor.imecauthor | Loo, Roger | |
| dc.contributor.orcidimec | Loo, Roger::0000-0003-3513-6058 | |
| dc.date.accessioned | 2021-10-16T00:54:51Z | |
| dc.date.available | 2021-10-16T00:54:51Z | |
| dc.date.issued | 2005 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/10199 | |
| dc.source.conference | 4th International conference on Silicon Epitaxy and Heterostructures - ICSI-4 | |
| dc.source.conferencedate | 23/05/2005 | |
| dc.source.conferencelocation | Hyogo Japan | |
| dc.title | Non-selective and selective thin SiGe strain-relaxed buffer layers: growth and carbon-induced relaxation | |
| dc.type | Proceedings paper | |
| dspace.entity.type | Publication | |
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