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Considering percolation path growth in low-k dielectric TDDB measurements

Date

2017
Proceedings Paper
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dc.contributor.authorWu, Chen
dc.contributor.authorLi, Yunlong
dc.contributor.authorTokei, Zsolt
dc.contributor.authorCroes, Kristof
dc.contributor.imecauthorWu, Chen
dc.contributor.imecauthorLi, Yunlong
dc.contributor.imecauthorTokei, Zsolt
dc.contributor.imecauthorCroes, Kristof
dc.contributor.orcidimecWu, Chen::0000-0002-4636-8842
dc.contributor.orcidimecLi, Yunlong::0000-0003-4791-4013
dc.contributor.orcidimecCroes, Kristof::0000-0002-3955-0638
dc.date.accessioned2021-10-24T19:08:39Z
dc.date.available2021-10-24T19:08:39Z
dc.date.embargo9999-12-31
dc.date.issued2017
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/29950
dc.identifier.urlhttp://ieeexplore.ieee.org/document/7968974/
dc.source.beginpage1
dc.source.conferenceIEEE International Interconnect Technology Conference - IITC
dc.source.conferencedate16/05/2017
dc.source.conferencelocationHsinchu Taiwan
dc.source.endpage3
dc.title

Considering percolation path growth in low-k dielectric TDDB measurements

dc.typeProceedings paper
dspace.entity.typePublication
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