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Pattern selection strategy by clustering for logic EPE monitoring

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dc.contributor.authorAnunciado, Roy
dc.contributor.authorNechaev, Konstantin
dc.contributor.authorSahraeian, Reza
dc.contributor.authorSchouwenberg, Jeroen
dc.contributor.authorSchelcher, Guillaume
dc.contributor.authorDas, Shubhankar
dc.contributor.authorPeng, Wei
dc.contributor.authorvan der Sandena, Stefan
dc.contributor.authorDillen, Harm
dc.contributor.imecauthorSchelcher, Guillaume
dc.contributor.imecauthorDas, Shubhankar
dc.contributor.orcidimecSchelcher, Guillaume::0000-0003-3383-1049
dc.contributor.orcidimecDas, Shubhankar::0000-0003-1830-1226
dc.date.accessioned2025-07-24T14:47:36Z
dc.date.available2025-05-11T05:44:06Z
dc.date.available2025-07-24T14:47:36Z
dc.date.issued2024
dc.identifier.doi10.1117/12.3034649
dc.identifier.eisbn978-1-5106-8156-9
dc.identifier.isbn978-1-5106-8155-2
dc.identifier.issn0277-786X
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/45651
dc.publisherSPIE-INT SOC OPTICAL ENGINEERING
dc.source.beginpageArt. 1321508
dc.source.conference2024 International Conference on Extreme Ultraviolet Lithography
dc.source.conferencedateSEP 30-OCT 03, 2024
dc.source.conferencelocationMonterey
dc.source.journalProceedings of SPIE
dc.source.numberofpages8
dc.source.volume13215
dc.title

Pattern selection strategy by clustering for logic EPE monitoring

dc.typeProceedings paper
dspace.entity.typePublication
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