Publication:
Selective oxidation of SiGe less than 50% versus Si using Low Temperature Steam Anneal at T less than or equal to 650°C
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1921 since deposited on 2021-10-26
9last month
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Acq. date: 2025-12-15
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Views
1921 since deposited on 2021-10-26
9last month
1last week
Acq. date: 2025-12-15
Citations